Follow
Sarah Bobek
Sarah Bobek
Verified email at ucr.edu
Title
Cited by
Cited by
Year
2‐Dimensional Transition Metal Dichalcogenides with Tunable Direct Band Gaps: MoS2(1–x)Se2x Monolayers
J Mann, Q Ma, PM Odenthal, M Isarraraz, D Le, E Preciado, D Barroso, ...
Advanced Materials 26 (9), 1399-1404, 2014
4302014
Highly etch selective amorphous carbon film
S Bobek, PK KULSHRESHTHA, R Prasad, KD Lee, H Whitesell, H Oshio, ...
US Patent 10,727,059, 2020
2642020
Chemical Vapor Deposition Growth of Few-Layer MoTe2 in the 2H, 1T′, and 1T Phases: Tunable Properties of MoTe2 Films
TA Empante, Y Zhou, V Klee, AE Nguyen, IH Lu, MD Valentin, ...
ACS nano 11 (1), 900-905, 2017
2392017
Superlinear Composition-Dependent Photocurrent in CVD-Grown Monolayer MoS2(1–x)Se2x Alloy Devices
V Klee, E Preciado, D Barroso, AE Nguyen, C Lee, KJ Erickson, M Triplett, ...
Nano letters 15 (4), 2612-2619, 2015
1582015
Postgrowth tuning of the bandgap of single-layer molybdenum disulfide films by sulfur/selenium exchange
Q Ma, M Isarraraz, CS Wang, E Preciado, V Klee, S Bobek, K Yamaguchi, ...
Acs Nano 8 (5), 4672-4677, 2014
1332014
Band structure characterization of WS2 grown by chemical vapor deposition
I Tanabe, M Gomez, WC Coley, D Le, EM Echeverria, G Stecklein, ...
Applied Physics Letters 108 (25), 2016
652016
Chemical vapor deposition growth of a periodic array of single-layer MoS2 islands via lithographic patterning of an SiO2/Si substrate
D Sun, AE Nguyen, D Barroso, X Zhang, E Preciado, S Bobek, V Klee, ...
2D Materials 2 (4), 045014, 2015
392015
An MoSx structure with high affinity for adsorbate interaction
D Sun, W Lu, D Le, Q Ma, M Aminpour, M Alcántara Ortigoza, S Bobek, ...
Angewandte Chemie-German Edition 124 (41), 10430, 2012
292012
Single- and few-layer transfer-printed CVD MoS2nanomechanical resonators with enhancement by thermal annealing
H Jia, R Yang, AE Nguyen, SN Alvillar, S Bobek, M Wurch, CY Huang, ...
2016 IEEE International Frequency Control Symposium (IFCS), 1-3, 2016
42016
Highly etch selective amorphous carbon film
R Prasad, S Bobek, PK Kulshreshtha, KD Lee, H Whitesell, H Oshio, ...
US Patent 11,469,107, 2022
32022
Characterization of film materials in wafer processing technology development by XPS
G Saheli, W Liu, C Lazik, Y Uritsky, M Bevan, W Tang, P Ma, ...
Journal of Electron Spectroscopy and Related Phenomena 231, 57-67, 2019
32019
Electrostatic chucking process
SM Bobek, VSC Parimi, PK Kulshreshtha, KD Lee
US Patent 12,100,609, 2024
22024
Method of in situ ceramic coating deposition
SM Bobek, AA Khaja, R Limdulpaiboon, KD Lee
US Patent 11,674,222, 2023
22023
Targeted heat control systems
VSC Parimi, S Radhakrishnan, MIN Xiaoquan, SM Bobek, S Ha, ...
US Patent 11,600,470, 2023
22023
An STM Study of Molecular Self-Assemblies on Cu (111): Structure, Interaction, and Effects of Confinement
M Luo
UC Riverside, 2012
22012
Highly etch selective amorphous carbon film
R Prasad, S Bobek, PK Kulshreshtha, KD Lee, H Whitesell, H Oshio, ...
US Patent 12,014,927, 2024
12024
Methods, systems, and apparatus for processing substrates using one or more amorphous carbon hardmask layers
K Nittala, SM Bobek, KD Lee, R Limdulpaiboon, D Kioussis, ...
US Patent 11,694,902, 2023
12023
Pedestal for substrate processing chambers
SM Bobek, VSC Parimi, PK Kulshreshtha, VK Prabhakar, KD Lee, S Ha, ...
US Patent 11,584,994, 2023
12023
Processing chamber deposition confinement
SM Bobek, VSC Parimi, S Ha, KD Lee
US Patent App. 17/077,624, 2022
12022
Methods, systems, and apparatus for processing substrates using one or more amorphous carbon hardmask layers
K Nittala, SM Bobek, KD Lee, R Limdulpaiboon, D Kioussis, ...
US Patent 12,131,913, 2024
2024
The system can't perform the operation now. Try again later.
Articles 1–20