Seong Keun Kim
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Resistive switching mechanism of TiO2 thin films grown by atomic-layer deposition
BJ Choi, DS Jeong, SK Kim, C Rohde, S Choi, JH Oh, HJ Kim, CS Hwang, ...
Journal of applied physics 98 (3), 2005
High dielectric constant TiO2 thin films on a Ru electrode grown at 250 C by atomic-layer deposition
SK Kim, WD Kim, KM Kim, CS Hwang, J Jeong
Applied Physics Letters 85 (18), 4112-4114, 2004
Al‐Doped TiO2 Films with Ultralow Leakage Currents for Next Generation DRAM Capacitors
SK Kim, GJ Choi, SY Lee, M Seo, SW Lee, JH Han, HS Ahn, S Han, ...
Advanced Materials 20 (8), 1429-1435, 2008
First-principles study of point defects in rutile
E Cho, S Han, HS Ahn, KR Lee, SK Kim, CS Hwang
Physical Review B 73 (19), 193202, 2006
Capacitors with an equivalent oxide thickness of< 0.5 nm for nanoscale electronic semiconductor memory
SK Kim, SW Lee, JH Han, B Lee, S Han, CS Hwang
Advanced Functional Materials 20 (18), 2989-3003, 2010
Atomic Layer Deposition for Semiconductors
CS Hwang
Atomic Layer Deposition for Semiconductors, E1-E1, 2014
Comparison between ZnO films grown by atomic layer deposition using H2O or O3 as oxidant
SK Kim, CS Hwang, SHK Park, SJ Yun
Thin Solid Films 478 (1-2), 103-108, 2005
Low temperature (< 100 C) deposition of aluminum oxide thin films by ALD with O3 as oxidant
SK Kim, SW Lee, CS Hwang, YS Min, JY Won, J Jeong
Journal of The Electrochemical Society 153 (5), F69, 2006
Wafer-scale growth of MoS 2 thin films by atomic layer deposition
JJ Pyeon, SH Kim, DS Jeong, SH Baek, CY Kang, JS Kim, SK Kim
Nanoscale 8 (20), 10792-10798, 2016
Atomic Layer Deposition of SrTiO3 Thin Films with Highly Enhanced Growth Rate for Ultrahigh Density Capacitors
SW Lee, JH Han, S Han, W Lee, JH Jang, M Seo, SK Kim, C Dussarrat, ...
Chemistry of Materials 23 (8), 2227-2236, 2011
Giant electrode effect on tunnelling electroresistance in ferroelectric tunnel junctions
R Soni, A Petraru, P Meuffels, O Vavra, M Ziegler, SK Kim, DS Jeong, ...
Nature Communications 5 (1), 5414, 2014
Atomic layer deposition of Ru thin films using 2, 4-(dimethylpentadienyl)(ethylcyclopentadienyl) Ru by a liquid injection system
SK Kim, SY Lee, SW Lee, GW Hwang, CS Hwang, JW Lee, J Jeong
Journal of The Electrochemical Society 154 (2), D95, 2007
Future of dynamic random-access memory as main memory
SK Kim, M Popovici
MRS Bulletin 43 (5), 334-339, 2018
Titanium dioxide thin films for next-generation memory devices
SK Kim, KM Kim, DS Jeong, W Jeon, KJ Yoon, CS Hwang
Journal of Materials Research 28 (3), 313, 2013
Plasma-enhanced atomic layer deposition of TiO2 and Al-doped TiO2 films using N2O and O2 reactants
GJ Choi, SK Kim, SJ Won, HJ Kim, CS Hwang
Journal of the Electrochemical Society 156 (9), G138, 2009
Fabrication of high-performance p-type thin film transistors using atomic-layer-deposited SnO films
SH Kim, IH Baek, DH Kim, JJ Pyeon, TM Chung, SH Baek, JS Kim, ...
Journal of Materials Chemistry C 5 (12), 3139-3145, 2017
Growth of p-Type Tin(II) Monoxide Thin Films by Atomic Layer Deposition from Bis(1-dimethylamino-2-methyl-2propoxy)tin and H2O
JH Han, YJ Chung, BK Park, SK Kim, HS Kim, CG Kim, TM Chung
Chemistry of Materials 26 (21), 6088-6091, 2014
Atomic-layer-deposited Al2O3 thin films with thin SiO2 layers grown by in situ O3 oxidation
SK Kim, CS Hwang
Journal of applied physics 96 (4), 2323-2329, 2004
Investigation on the growth initiation of Ru thin films by atomic layer deposition
SK Kim, JH Han, GH Kim, CS Hwang
Chemistry of materials 22 (9), 2850-2856, 2010
Interfacial control of oxygen vacancy doping and electrical conduction in thin film oxide heterostructures
BW Veal, SK Kim, P Zapol, H Iddir, PM Baldo, JA Eastman
Nature communications 7 (1), 11892, 2016
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Articles 1–20