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Seong Keun Kim
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Resistive switching mechanism of TiO2 thin films grown by atomic-layer deposition
BJ Choi, DS Jeong, SK Kim, C Rohde, S Choi, JH Oh, HJ Kim, CS Hwang, ...
Journal of applied physics 98 (3), 2005
14682005
High dielectric constant TiO2 thin films on a Ru electrode grown at 250 C by atomic-layer deposition
SK Kim, WD Kim, KM Kim, CS Hwang, J Jeong
Applied Physics Letters 85 (18), 4112-4114, 2004
4052004
Al‐Doped TiO2 Films with Ultralow Leakage Currents for Next Generation DRAM Capacitors
SK Kim, GJ Choi, SY Lee, M Seo, SW Lee, JH Han, HS Ahn, S Han, ...
Advanced Materials 20 (8), 1429-1435, 2008
3452008
First-principles study of point defects in rutile
E Cho, S Han, HS Ahn, KR Lee, SK Kim, CS Hwang
Physical Review B 73 (19), 193202, 2006
2762006
Capacitors with an equivalent oxide thickness of< 0.5 nm for nanoscale electronic semiconductor memory
SK Kim, SW Lee, JH Han, B Lee, S Han, CS Hwang
Advanced Functional Materials 20 (18), 2989-3003, 2010
2552010
Atomic Layer Deposition for Semiconductors
CS Hwang
Atomic Layer Deposition for Semiconductors, E1-E1, 2014
2202014
Comparison between ZnO films grown by atomic layer deposition using H2O or O3 as oxidant
SK Kim, CS Hwang, SHK Park, SJ Yun
Thin Solid Films 478 (1-2), 103-108, 2005
2052005
Low temperature (< 100 C) deposition of aluminum oxide thin films by ALD with O3 as oxidant
SK Kim, SW Lee, CS Hwang, YS Min, JY Won, J Jeong
Journal of The Electrochemical Society 153 (5), F69, 2006
2042006
Wafer-scale growth of MoS 2 thin films by atomic layer deposition
JJ Pyeon, SH Kim, DS Jeong, SH Baek, CY Kang, JS Kim, SK Kim
Nanoscale 8 (20), 10792-10798, 2016
1652016
Atomic Layer Deposition of SrTiO3 Thin Films with Highly Enhanced Growth Rate for Ultrahigh Density Capacitors
SW Lee, JH Han, S Han, W Lee, JH Jang, M Seo, SK Kim, C Dussarrat, ...
Chemistry of Materials 23 (8), 2227-2236, 2011
1552011
Giant electrode effect on tunnelling electroresistance in ferroelectric tunnel junctions
R Soni, A Petraru, P Meuffels, O Vavra, M Ziegler, SK Kim, DS Jeong, ...
Nature Communications 5 (1), 5414, 2014
1412014
Atomic layer deposition of Ru thin films using 2, 4-(dimethylpentadienyl)(ethylcyclopentadienyl) Ru by a liquid injection system
SK Kim, SY Lee, SW Lee, GW Hwang, CS Hwang, JW Lee, J Jeong
Journal of The Electrochemical Society 154 (2), D95, 2007
1202007
Future of dynamic random-access memory as main memory
SK Kim, M Popovici
MRS Bulletin 43 (5), 334-339, 2018
1192018
Titanium dioxide thin films for next-generation memory devices
SK Kim, KM Kim, DS Jeong, W Jeon, KJ Yoon, CS Hwang
Journal of Materials Research 28 (3), 313, 2013
1092013
Plasma-enhanced atomic layer deposition of TiO2 and Al-doped TiO2 films using N2O and O2 reactants
GJ Choi, SK Kim, SJ Won, HJ Kim, CS Hwang
Journal of the Electrochemical Society 156 (9), G138, 2009
1072009
Fabrication of high-performance p-type thin film transistors using atomic-layer-deposited SnO films
SH Kim, IH Baek, DH Kim, JJ Pyeon, TM Chung, SH Baek, JS Kim, ...
Journal of Materials Chemistry C 5 (12), 3139-3145, 2017
992017
Growth of p-Type Tin(II) Monoxide Thin Films by Atomic Layer Deposition from Bis(1-dimethylamino-2-methyl-2propoxy)tin and H2O
JH Han, YJ Chung, BK Park, SK Kim, HS Kim, CG Kim, TM Chung
Chemistry of Materials 26 (21), 6088-6091, 2014
952014
Atomic-layer-deposited Al2O3 thin films with thin SiO2 layers grown by in situ O3 oxidation
SK Kim, CS Hwang
Journal of applied physics 96 (4), 2323-2329, 2004
922004
Investigation on the growth initiation of Ru thin films by atomic layer deposition
SK Kim, JH Han, GH Kim, CS Hwang
Chemistry of materials 22 (9), 2850-2856, 2010
902010
Interfacial control of oxygen vacancy doping and electrical conduction in thin film oxide heterostructures
BW Veal, SK Kim, P Zapol, H Iddir, PM Baldo, JA Eastman
Nature communications 7 (1), 11892, 2016
892016
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Articles 1–20